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Home Chemistry Catalysts for Para-Selective Preparing Para-Dichlorobenzene and Para-Chlorotoluene

Catalysts for Para-Selective Preparing Para-Dichlorobenzene and Para-Chlorotoluene

Description

Chlorinated aromatic compounds are widely used in different fields. Chlorotoluene derivatives are used as intermediates in medicine and agrochemistry.

p-Dichlorobenzene is a useful intermediate product for the synthesis of dyestuff, drug precursors, deodorant blocks and moth control. A growing use in the production of the high performance polymer of poly(phenylene sulfide). Para isomers of dichlorobenzene (DCB) and monochlorotoluene (CT) are usually more valuable than ortho-isomers. Hence of great importance is the processes with high para-selectivity.

Conventional commercial processes for chlorinated toluene and benzene or chlorobenzene has been carried out, most commonly, in the presence of Lewis acid catalyst such as SbCl5, FeCl3 or AlCl3 which produce about 2/1 para/ortho isomer ratio of chlorotoluenes and 3/2 ratio of para/orthodichlorobenzenes.

The high selectivity to the para isomers was achieved in the field of zeolite based catalysis and in the Lewis Acid technology with the use of substituted phenothiazines as cocatalysts, but these technologies are very expensive.

We propose a novel para-selective catalyst for chlorobenzene and toluene chlorination.

Innovative Aspect and Main Advantages

Catalyst PCB was developed jointly by the Institute of Organic Chemistry NASU (Kiev) and PPG Industries Inc. (USA). Catalyst PCB consists of the ferric chloride and cheap cocatalyst.

This cheap composition displays high para-selectivity, up to 80 %. The catalytic composition PCT for more high yield of p-chlorotoluene was developed.



Stage of Development

The catalysts PCB and PCT are defended by „know how“.

Contact Details

Institute of Organic Chemistry National Academy of Sciences of Ukraine
Address: 5, Murmanskaya str., 02660, Kiev-94, Ukraine
Tel.: (+38 044) 559 0436
Fax: (+38 044) 573 2643
E-mail: This e-mail address is being protected from spambots. You need JavaScript enabled to view it ; This e-mail address is being protected from spambots. You need JavaScript enabled to view it

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