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Home Industrial Technologies Processes and equipment for synthesis of diamond electrodes for sewage treatment

Processes and equipment for synthesis of diamond electrodes for sewage treatment

Description

Conductive diamond and diamond-like films can be used for electrodes manufacture in an electrochemistry. Such unique electrodes possess simultaneously high chemical stability, wide window of potentials, have a low level of background currents and are not polluted under operation in electrolytes. There are different plasma methods for the diamond and diamond-like coatings deposition. The process of diamond-like nitrogen-doped coating deposition and high-efficiency equipment (vacuum-arc plasma source with the magnetic filter which turns the plasma stream on 90о) for deposition such films is developed.

Innovative Aspect and Main Advantages

Efficiency of the main versions of known vacuum-arc plasma systems and our results


The ratio of the total ion flow at the channel exit to the discharge current (Ii/Id) - the system efficiency

Areas of Application

Conductive diamond-like films can be used for electrodes manufacture for an oxidizing of organic compounds in industrial technology of natural water and sewage treatment. Degree of water treatment from organic compounds achieves 90 %.

Formation of the active chlorine at anode processing of chloride-containing solutions can be used for disinfecting water (for example, in swimming pools, etc).

Electrochemical disinfection of water by means of diamond-like electrodes is much more effective in comparison with the chemical one.

Electrodes with diamond-like carbon coatings can be cheap and accessible to mass production and application.

Filtered vacuum-arc plasma source described can be used for the following coating deposition: conductive diamond-like films, metals (Ti, Cr, Nb, Mo, Cu, Al, etc.), alloys, nitrides, oxides, carbides, composites, multilayer coatings that dramatically extends opportunities of the given technology.

Besides the given equipment can be used for a deposition:

  • wear-resistant coatings at surfaces of fine mechanic elements;
  • decorative coatings;
  • hard protective coatings on magnetic and optic devices;
  • transparent conducting hard films in solar sells, helio-concentrators and low-e films on architectonic glass;
  • protective biologically indifferent coatings;

Above mentioned filtered plasma source may be used:

  • in new vacuum-arc industrial equipment for the ion plasma processing of materials including deposition of high quality micro- and nanostructural coatings;
  • when upgrading of existent vacuum-arc equipment for widening their technological potentiality;
  • for high quality coating deposition processes in machine building, fine mechanics, microelectronics, optics, automobile industries, etc.

Coating deposition rate is 6 μm/h at the diameter 20 cm.
Fig. 1 Coating deposition rate is 6 μm/h at the diameter 20 cm.

Stage of Development

Prototype available for testing; patented in USA.

Contact Details

Volodymyr Strelnytskiy
Organization: National Science Centre “Kharkov Institute of Physics and Technology”
Address: Akademicheskaya, 1, Kharkov 61108, Ukraine.
+ 38-057-3356561
This e-mail address is being protected from spambots. You need JavaScript enabled to view it

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