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Home Material Sciences Deposition Technology Of Organic-Inorganic Nano-Compositr Thin Films

Deposition Technology Of Organic-Inorganic Nano-Compositr Thin Films


  1. Original vacuum deposition technology of polytetrafluoroethylene (PTFE) thin film. It includes treatment of PTFE vapors with electron beam. But it is neither electron beam evaporation, nor any kind of plasma methods. This feature allows co-deposition of PTFE with fragile organic molecules, thus forming PTFE matrix filled with organic and/or inorganic nano-clusters. Low power not self-sustained RF-plasma can be used for modification of film adhesion and PTFE properties: refractive index value, mechanical strength and flexibility. PTFE films, filled with gold etc. metal nano-clusters; filled with different kinds of polymethine, phthalocyanine, calixarene etc. organic nano-clusters; and filled with both metal and organic nano-clusters were produced. Films of other fluorinated polyolefines and polyparaphenylene sulphide also were produced and filled with nano-clusters.
  2. Oriented growth of organic films onto our vacuum deposited and than rubbed PTFE. Substrate temperature can be 20-800C, which is applicable for using of plastic substrate. Creation of dye quantum dots.
  3. 20 years of experimental research concerned evaporability of organic dyes. Systematic studies of asymmetric dyes evaporability. Huge data of evaporable and not evaporable dyes. How substituents are affecting core chromophore evaporability.
  4. Deposition of complex organic films employing chemical reactions in gas phase or substrate, using purposefully constructed compounds.
  5. Creation of the nano-sized active units, using ultra-thin films of purposefully constructed compounds and acting on them by AFM tip for chemical reactions in nano-volume.

Innovative Aspect and Main Advantages

  1. Only this technology allows PTFE film deposition with independent modification of film characteristics and co-deposition with other organic molecules on the not heated substrate.
  2. New stable evaporable compounds with controlled intra- and intermolecular interactions.
  3. Organic functional films with extra stability.
  4. Backgrounds for nano-sized optics and electronics.

Areas of Application

  1. Low-k dielectric for microelectronics, waveguiding films in all UV-VIS-NIR range and protective barrier coatings. Beam splitter, modulator, optical switch and logic units in integrated-optic devices. Sensitive layers for artifical nose etc. bio- aggressive- toxic- compounds sensors.
  2. Passive and active layers in organic light emitting devices, flat panel displays, organic electronics and flexible plastic logic.
  3. Nano-sized electronics, plasmonics and photonics, superhigh density information storage.

Fig. 1

Stage of Development

  1. Tested, available for demonstration.
  2. Development stage.
  3. Conceptual stage.

Contact Details

Konstantin Grytsenko, Ph.D.
Institute of Semiconductor Physics of NASU
Address: Ukraine, 03650, Kyiv -28, Pr.Nauki 45
Phone: +380 44 525-5937
Fax: +380 44 525-5530
E-mail: This e-mail address is being protected from spambots. You need JavaScript enabled to view it ,
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